名称：曝光灯

OEM是欢迎！

辐射主要是265-420nm之间的波长为365nm ，生产可从50-180w /平方厘米。 适合于彩色印刷，油漆涂料，烘干。

基于高压汞灯，最适合液体电阻的接触过程中金属卤化物灯。
UV油墨的固化或曝光制版，通过添加卤素化合物，辐射300 〜 400nm的的波长足够。

镓灯和辐射400 〜 450nm的波长的紫外线abundunt辐射。 最佳的光刻工艺。

Name: exposure lamp

OEM are welcome!

Radiate 365nm wavelength mostly between 265-420nm, production is available from 50-180w/ cm. suit for color print, paint coating and drying.

Metal halide lamp based on high pressure mercury, optimum for liquid resister's exposure process.
UV ink's curing or exposure for photoengraving, by adding halogen compounds, radiate 300~400nm's wavelength sufficiently.

Gallium lamps and radiate 400~450nm wavelength's abundunt UV radiations. Optimum for photoengraving process.