More information about offset PS plate:
1. The highly pure aluminum base from qualify suppliers.
2. Chemically micro-electronic grain process, generate an even grain layer
3. Durable anodic oxidization layer, higher run length.
4. Light sensitive layer, has wide exposure latitude, high contrast in exposure and developer, reproduction faithfully.
5. Vacuum layer, quicker film-plate contact, shorten exposure process.
6. CXK available to offer thickness range at: 0.15mm 0.40mm, and 0.15mm punched.
To get best plate effect, please note the following while using CXK PS plate:
1. Exposure
A. Light Source: Unseal under dark or yellow light. Iodine Gallium Lamp is suggested as Exposure Light Source.
B. Exposure time: 60-80seconds ( based on: 3000W, 1m light distance, new light)
C. FUJI grey scale could assist to fix a best exposure time: 2ND step blank, 3rd step inked.
Note: Please fix a reasonable exposure time according to actual light source, power, brightness, distance and all related situation.
2. Develop
A. Process Time: 30-60 seconds.
B. Solution Temperature: 25° C ± 1° Cplusmn; 1° Cg; Cplusmn; 1° C
Note: Please renew or supplement the developer regularly and pay attention to a proper solution density.